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Home > Âü¿©±â¾÷ > ±â¾÷Á¦Ç°¼Ò°³ |
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Dry Etcher - (ÁÖ)¾ÆÀ̾¾µð |
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±Û¾´ÀÌ : ÀÌ´ë¿ë
³¯Â¥ : 13-10-25 10:17
Á¶È¸ : 700
Æ®·¢¹é ÁÖ¼Ò |
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Âü¿©±â¾÷ ¿ì¼öÁ¦Ç° ¼Ò°³»ùÇÃ_20131024(¾ÆÀ̾¾µð).hwp (24.0K), Down : 15, 2013-10-25 10:17:52 |
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ȸ»ç¸í : (ÁÖ)¾ÆÀ̾¾µð
ºÐ¾ß : Plasma ±â¼ú
ȨÆäÀÌÁöÁÖ¼Ò : http://www.icd.co.kr/
ȸ»çÁÖ¼Ò : °æ±âµµ ¾È¼º½Ã ´ë´ö¸é ¼Ò³»¸® 321-1
ÀüȹøÈ£ : 031-678-3333
Features
1. Available glass size : 1st Gen ~ 8th Gen.
2. PE, RiE, DCCP Type
3. Cluster type system
Applications
1. Pas SiNx / Gi SiNx Etch
2. a-Si Etch
3. n+ Etch
4.Continuous Dry Etch for 4mask
(SD/n+/a-Si Dry Etch > halftone mask Ashing > SD metal dry Etch > n+ Dry Etch)
Benefits
1. High throughput
2. High Uptime - Reliable System
3. Easy Maintenance
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