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  Dry Etcher - (ÁÖ)¾ÆÀ̾¾µð
  ±Û¾´ÀÌ : ÀÌ´ë¿ë     ³¯Â¥ : 13-10-25 10:17     Á¶È¸ : 700     Æ®·¢¹é ÁÖ¼Ò
   Âü¿©±â¾÷ ¿ì¼öÁ¦Ç° ¼Ò°³»ùÇÃ_20131024(¾ÆÀ̾¾µð).hwp (24.0K), Down : 15, 2013-10-25 10:17:52
ȸ»ç¸í : (ÁÖ)¾ÆÀ̾¾µð
ºÐ¾ß : Plasma ±â¼ú
ȨÆäÀÌÁöÁÖ¼Ò : http://www.icd.co.kr/
ȸ»çÁÖ¼Ò : °æ±âµµ ¾È¼º½Ã ´ë´ö¸é ¼Ò³»¸® 321-1
ÀüÈ­¹øÈ£ : 031-678-3333

Features

1. Available glass size : 1st Gen ~ 8th Gen.
2. PE, RiE, DCCP Type
3. Cluster type system

Applications

1. Pas SiNx / Gi SiNx Etch
2. a-Si Etch
3. n+ Etch
4.Continuous Dry Etch for 4mask
  (SD/n+/a-Si Dry Etch > halftone mask Ashing > SD metal dry Etch > n+ Dry Etch)

Benefits

1. High throughput
2. High Uptime - Reliable System
3. Easy Maintenance